Rigorous simulations of 3D patterns on extreme ultraviolet lithography masks
Cell Transformation, Viral
Receptors, Cell Surface
Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. In a detailed convergence study it is shown that accurate results can be attained for relatively large 3D computational domains and in the presence of sidewall-angles and corner-roundings. © 2011 SPIE.
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