EMF simulations of isolated and periodic 3D photomask patterns Conference Paper uri icon

Overview

MeSH Major

  • Cell Transformation, Viral
  • Oncogenes
  • Receptors, Cell Surface

abstract

  • We present rigorous 3D EMF simulations of isolated features on photomasks using a newly developed finite-element method. We report on the current status of the finite-element solver JCMsuite, incorporating higher-order edge elements, adaptive refinement methods, and fast solution algorithms. We demonstrate that rigorous and accurate results on light scattering off isolated features can be achived at relatively low computational cost, compared to the standard approach of simulations on large-pitch, periodic computational domains.

publication date

  • December 2007

Research

keywords

  • Conference Paper

Identity

Digital Object Identifier (DOI)

  • 10.1117/12.746392

Additional Document Info

volume

  • 6730