Domain decomposition method for electromagnetic scattering problems: Application to EUV lithography Conference Paper uri icon

Overview

MeSH Major

  • Cell Transformation, Viral
  • Oncogenes
  • Receptors, Cell Surface

abstract

  • We present a domain decomposition approach for the computation of the electromagnetic field within a EUV lithography line mask. We use an additive Schwarz method with transparent boundary conditions at the interfaces of the domains. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a dramatical reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer. © 2005 IEEE.

publication date

  • December 2005

Research

keywords

  • Conference Paper

Identity

Digital Object Identifier (DOI)

  • 10.1109/NUSOD.2005.1518132

Additional Document Info

start page

  • 55

end page

  • 56

volume

  • 2005